Stability of InP oxide versus solvated electrons in liquid ammonia - 01/03/13
pages | 5 |
Iconographies | 4 |
Vidéos | 0 |
Autres | 0 |
Abstract |
In alkaline aqueous medium (pH 9), potassium ferricyanide was used as an oxidizing agent on InP. This electroless process was successfully controlled by capacity measurements, AFM and XPS analyses. For the first time, the chemical stability of the oxide has been studied against the strongest reducing agent in liquid ammonia (−50°C): the solvated electron. It was obtained in two ways; an electroless process which involved the addition of metallic potassium and by cathodic galvanostatic treatment on InP in neutral medium. As a first result, the electroless process required a strong rinsing step of the surface by pure liquid ammonia. As a second result, the galvanostatic process gave also promising results. A significant decrease of the amount of oxide was evidenced by capacity measurements, AFM and XPS analyses.
Le texte complet de cet article est disponible en PDF.Keywords : Non-aqueous solvent, Liquid ammonia, III-V semiconductor, Solvated electron, Interface, Oxide surface
Plan
Vol 16 - N° 1
P. 34-38 - janvier 2013 Retour au numéroBienvenue sur EM-consulte, la référence des professionnels de santé.
L’accès au texte intégral de cet article nécessite un abonnement.
Bienvenue sur EM-consulte, la référence des professionnels de santé.
L’achat d’article à l’unité est indisponible à l’heure actuelle.
Déjà abonné à cette revue ?